Rutherford Backscattering Spectroscopy

Physico-chemical properties of plasma-polymerized tetravinylsilane

Materials Engineering / Condensed Matter Physics / Atomic Force Microscopy / Surface Roughness / Infrared spectroscopy / Refractive Index / Surface and Coatings Technology / Silicon Wafer / Elastic Modulus / Flow Rate / Rutherford Backscattering Spectroscopy / Spectroscopic Techniques / Physico chemical Properties / Refractive Index / Surface and Coatings Technology / Silicon Wafer / Elastic Modulus / Flow Rate / Rutherford Backscattering Spectroscopy / Spectroscopic Techniques / Physico chemical Properties

Physico-chemical properties of plasma-polymerized tetravinylsilane

Materials Engineering / Condensed Matter Physics / Atomic Force Microscopy / Surface Roughness / Infrared spectroscopy / Refractive Index / Surface and Coatings Technology / Silicon Wafer / Elastic Modulus / Flow Rate / Rutherford Backscattering Spectroscopy / Spectroscopic Techniques / Physico chemical Properties / Refractive Index / Surface and Coatings Technology / Silicon Wafer / Elastic Modulus / Flow Rate / Rutherford Backscattering Spectroscopy / Spectroscopic Techniques / Physico chemical Properties

Ta–Si contacts to n-SiC for high temperatures devices

Engineering / Comparative Study / Silicon Carbide / Physical sciences / Surface Morphology / High Temperature / CHEMICAL SCIENCES / X ray diffraction / Electrical Properties / Microstructures / Contact Resistance / Ohmic Contact / Rf-Magnetron Sputtering / Rutherford Backscattering Spectroscopy / Current-Voltage Characteristic / High Temperature / CHEMICAL SCIENCES / X ray diffraction / Electrical Properties / Microstructures / Contact Resistance / Ohmic Contact / Rf-Magnetron Sputtering / Rutherford Backscattering Spectroscopy / Current-Voltage Characteristic

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